- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/82 - Auxiliary processes, e.g. cleaning
Patent holdings for IPC class G03F 1/82
Total number of patents in this class: 270
10-year publication summary
|
18
|
15
|
26
|
33
|
21
|
28
|
31
|
34
|
28
|
11
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
69 |
| ASML Netherlands B.V. | 6816 |
23 |
| Applied Materials, Inc. | 16587 |
16 |
| Suss MicroTec Photomask Equipment GmbH & Co. KG | 24 |
14 |
| Hoya Corporation | 2822 |
12 |
| Carl Zeiss SMT GmbH | 2646 |
11 |
| Bruker Nano, Inc. | 334 |
11 |
| Samsung Electronics Co., Ltd. | 131630 |
9 |
| Exogenesis Corporation | 77 |
8 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
7 |
| Screen Holdings Co., Ltd. | 2431 |
7 |
| International Business Machines Corporation | 60644 |
4 |
| Photronics, Inc. | 47 |
3 |
| Semes Co., Ltd. | 1119 |
3 |
| Gudeng Equipment Co., Ltd. | 12 |
3 |
| Agc, Inc. | 4029 |
3 |
| Kioxia Corporation | 9847 |
3 |
| FUJIFILM Corporation | 27102 |
2 |
| Tokyo Electron Limited | 11599 |
2 |
| Nikon Corporation | 7162 |
2 |
| Other owners | 58 |